JPS63142807U - - Google Patents

Info

Publication number
JPS63142807U
JPS63142807U JP3496087U JP3496087U JPS63142807U JP S63142807 U JPS63142807 U JP S63142807U JP 3496087 U JP3496087 U JP 3496087U JP 3496087 U JP3496087 U JP 3496087U JP S63142807 U JPS63142807 U JP S63142807U
Authority
JP
Japan
Prior art keywords
pulse transformer
coil
shield
double
printed board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3496087U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3496087U priority Critical patent/JPS63142807U/ja
Publication of JPS63142807U publication Critical patent/JPS63142807U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coils Or Transformers For Communication (AREA)
JP3496087U 1987-03-10 1987-03-10 Pending JPS63142807U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3496087U JPS63142807U (en]) 1987-03-10 1987-03-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3496087U JPS63142807U (en]) 1987-03-10 1987-03-10

Publications (1)

Publication Number Publication Date
JPS63142807U true JPS63142807U (en]) 1988-09-20

Family

ID=30844006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3496087U Pending JPS63142807U (en]) 1987-03-10 1987-03-10

Country Status (1)

Country Link
JP (1) JPS63142807U (en])

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6872605B2 (en) 1992-12-04 2005-03-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating the same
US6964890B1 (en) 1992-03-17 2005-11-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
US6979605B2 (en) 2001-11-30 2005-12-27 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light
US6987283B2 (en) 1993-03-12 2006-01-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device structure
US7050878B2 (en) 2001-11-22 2006-05-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductror fabricating apparatus
US7133737B2 (en) 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7214573B2 (en) 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
US7622335B2 (en) 1992-12-04 2009-11-24 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a thin film transistor device

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964890B1 (en) 1992-03-17 2005-11-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
US7564057B1 (en) 1992-03-17 2009-07-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having an aluminum nitride film
US7622335B2 (en) 1992-12-04 2009-11-24 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a thin film transistor device
US6872605B2 (en) 1992-12-04 2005-03-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating the same
US6987283B2 (en) 1993-03-12 2006-01-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device structure
US7391051B2 (en) 1993-03-12 2008-06-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device forming method
US7238558B2 (en) 1993-06-30 2007-07-03 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating the same
US7439115B2 (en) 2001-11-22 2008-10-21 Semiconductor Eneregy Laboratory Co., Ltd. Semiconductor fabricating apparatus
US7050878B2 (en) 2001-11-22 2006-05-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductror fabricating apparatus
US7133737B2 (en) 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7510920B2 (en) 2001-11-30 2009-03-31 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film
US7588974B2 (en) 2001-11-30 2009-09-15 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US6979605B2 (en) 2001-11-30 2005-12-27 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light
US7214573B2 (en) 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
US7560397B2 (en) 2001-12-11 2009-07-14 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and method of manufacturing a semiconductor device

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